Titanium Sputtering Target

Product Description

Our company is a specialty manufacturer to engage in the manufacture of sputtering target materials in many years. We can supply a variety of high quality sputtering targets for the thin film in the following industries: Glass, motor, machine work, optical coating, semiconductor, optical disk, magnetic head etc. In addition to domestic market, our products have been exported to foreign market including Germany, America. The quality of target materials is deeply trusted by our customer. Our sputtering target products made by hot isostatic pressure, they have four characteristics I. E. High purity, high density, good organizations structure, long life-span, they are the best manufacturing of magnetic control sputtering target.
The pure Ti-Al alloy sputtering target, Cr and Cr alloy sputtering target, Al and Al alloy sputtering target, Si and SiO2 sputtering target, ITO sputtering target, Zr sputtering target, Mg sputtering target, AG sputtering target are our primary goods. We supply about7000pieces/year. By advanced HIP have many advantages, such as high
Purity, high density, homogenous microstructure, fine grain, long working life etc
Purity: 99%, 99.9%, 99.95% 99.99%, 99.995% 99.999% and 99.9999%.
Shape: Foil, sheet, rod, pipe, tube, ring, wafer, plate, tablet and base on your drawing.
Disk, rectangle, band, rod and other shapes.
Dimension: Diameter (<650mm), Length (<1600mm), Width (<500mm), Thickness (>1mm), Custom-Made.
Packing: Wooden box.
We would be interested in receiving your inquiries for all Goods, against which we will send you our quotations in USD or EUR, FOB Beijing of China or DDU your ports, packing included. Terms of payment to be arranged.
Our production are in high quality and lower price in China. Please feel free to contract! We believe that you will be satisfied with our products and services.
Wish we will have a pleasent and successful cooperation!